UVTM provides a complete line of sputtering targets for virtually all metallizers in use today, which is available for CD/VCD/DVD, CD/DVD-ROM, CD-R/DVD+R and Blu-ray Disc.

The sputtering targets of disc-applied Pure silver, aluminum and copper alloy in UVTM were produced for characteristic of disc film.

Ti50Cr50 sputtering target TiCr, TiAl, TiNi, NiV , 99.99%Ti, 99.995%Ti , 99.99Ni, Al , Nb, Cr99.95%   Round target, Dia.50-300mm Thickness 15-80mm Plate target, Length 100-600mm Width 30-300mm ...

AZO Sputtering Target ZnO doped Al2O3 Sputtering Target ZnO:98wt% Al2O3:2wt% A、Back metallisation up to 1600 x 1000mm B、Metallic and non-metallic bond&n...

Description Changsha xinkang advanced materials co., ltd specializes in producing high purity Aluminum Silicon Sputtering Targets with the highest possible densityand smallest possible average grai...

Tantalum sputtering target Material: RO5200, RO5400, RO5252(Ta-2.5W), RO5255(Ta-10W) Purity: >=99.95% or 99.99%

Materials: rotary ZnSn Purity :more than 99% Density:7.3g/cm3 Composition:50/50wt% or 85/15wt% Manufacturing process :Casted on backing tube Add: We can manufacture as your requires

Able Target Limited is a professional manufacturer of coating film materials, sputtering targets, and an excellent supplier of nonferrous metals, evaporation material, crucible, high purity materials, rare earth materials and alloys for Flat Panel Display industry , Architectural and automotive glass coating , Optical communication and optical storage coating, Electronic Coating, Solar panel coating, Semiconductor, PVD coating industry, and all kinds of downstream industry of sputtering target. Able Target Limited have best excellent engineers with experenced skills and a specialty Magnetron Sputtering Technology focused on its core skills in producing coating film materials, precious metals, fine chemicals and processing technology

For decorative coating applications for products such as cell phones, watch cases and bands, laptop covers, eyeglass frames and sunglasses, kitchen and bathroom faucets. ZETAMETAL provide the metals and alloys worldwide. Primary target materials such as Chromium, Titanium, and Zirconium are used to create a rainbow of colors and provide wear protection. We professionally offer best quality sputtering targets for the large area coating, decorative and hard coatings market with your special technical requirement.PVD Coating Technology ——Metal material targets with planner and tube kinds of shapes by customized need. Our on-going R&D—— •New Alloy material sputtering target is on-going R&D in order to Improve anti-corrosion and anti-oxidation ability. Aim to meet customer's need in Semiconductor application.

Offer zirconium sputtering targets and titanium sputtering targets. Offer sputtering target for protective film. zirconium , from USA

supply simple targets, alloyed targets, targets of intermetallic compounds and targets of ceramics. rare earth alloys include Nd-Fe Alloys Series, Nd-Fe-B Alloys Series, Tb-Fe Alloys Series, Y Alloys Series xxxxx than twenty types of single RE xxxxx function material. It can elongate or shorten under a changed magnetic field, and therefore can achieve a transformation between sound energy, electromagnetic energy, and mechanical energy

Sputtering Targets Sputtering materials for the applications to magnetic disk and head, magneto optical disk, optical disk, superconducting thin film, protective film. Metal Sputtering Targets (include Rare Earth metal Sputtering Target): Al, Sb, Bi , B , Cd , C, Ce , Cr , Co , Cu , Dy, Er, Eu, Gd, Ge , Au , C, Hf, Ho, In , Ir , Fe , La, Lu , Mg, Mn, Mo , Nd, Ni, Nb, Pd, Pt , Pr, Re , Ru , Sm, Se , Sc, Ag, Si , Ta, Tb, Tm, Sn, Ti, W, V , Yb, Y, Zr, Zn, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu , Sc, Y Alloy Sputtering Targets: AlCu, AlCr, AlMg, AlSi, AlSiCu, AlAg, AlV, CaNiCrFe, CaNiCrFeMoMn, CeGd, CeSm, CrSi, CoCr, CoCrMo, CoFe, CoFeB, CoNi, CoNiCr, CoPt, CoNbZr, CoTaZr, CoZr, CrV, CrB, CrSi, CrCu, CuCo , CuGa, CuIn, CuNi, CoNiPt, CuZr, DyFe, DyFeCo, FeB, FeC, FeMn, GdFe, GdFeCo, HfFe, IrMn, IrRe, InSn, MoSi, NiAl, NiCr, NiCrSi, NdDyFeCo, NiFe, NiMn, NiNbTi , NiTi, NiV, SmCo, AgCu, AgSn, TaAl, TbDyFe, TbFe, TbFeCo, TbGdFeCo, TiAl, TiNi, TiCr, WRe , WTi, WC...

1.) Metal sputtering target: Silver, Ag, Osmium, Os, Platinum, Pt, Palladium, Pd, Iridium, Ir, Ruthenium, Ru, Rhenium, Re, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Sc, Y, Silicon, Si, Tellurium, Te, Bismuth, Bi, Tin, Sn, Zinc, Zn, Sulphur, S, Graphite, C, Boron, B, Lead, Pb, Antimony, Sb, Selenium, Se, Chromium, Cr, Cobalt, Co, Aluminum, Al, Nickel, Ni, Titanium, Ti, Tungsten, W, Molybdenum, Mo, Tantalum, Ta, Niobium, Nb, Zirconium, Zr, Hafnium, Hf, Vanadium, V, Germanium, Ge, Indium In, Copper, Cu, Iron, Fe, Manganese, Mn, , Magnesium, Mg, Barium, Ba, Cadmium, Cd, Calcium, Ca, Strontium, Sr. 2.) Oxide sputtering target: La2O3, CeO2, Nd2O3, Sm2O3, Eu2O3, Gd2O3, Tb4O7, Dy2O3, Ho2O3, Er2O3, Tm2O3, Yb2O3, Lu2O3, Sc2O3, Y2O3, Ta2O5, Nb2O5, Ga2O3, V2O5, ZrO2 doped with Ti, WO3, HfO2, MgO, Al2O3, Indium Tin Oxide, ITO (In2O3-SnO2), ZnO, Al2O3 doped ZnO (AZO), Ga2O3 doped ZnO (GZO), La0.67Sr0.33MnO3 (LSMO), ZrO2-Y2O3 stabilized (YSZ), ZrO2+Ti, ZrO2+SiO2, Bi2O3, Cr2O3, M...