CENTRE METALLURGY TECH
LTD specializes in manufacturing a wide range
of high quality sputtering targets ,which are extensively used in
the industries of architectural & auto glass, optics, solar
photovoltaic, flat panel display, decoration, electronics,
semiconductor and etc.
The sputtering targets we are manufacturing show
outstanding performance by virtue of high density, excellent
purity, and distinguished homogeneous
microstructure.
Our sputtering targets mainly consist of pure
metals and alloys, available in both planar and rotatable
shapes.
Featured targets from
Rhexon:
1.Pure
Metal:
Ti, Zr, Ta, Nb, Mo, W, Ni, Cr, Al, Zn, Si,
Cu,ITO,AZO.TZO,WC,Nb2O5,TiO2, SiO2
with planar and rotary type.,
2.Typical
alloy target :
1) Ti/Al
alloy target (67:33,50:50at%)
2)
W/Ti alloy target (90:10wt%),
3)
Ni/V alloy target (93:7,wt%)
4)
Ni/Cr alloy target (80:20,
70:30,wt%),
5)
Al/Cr alloy target (70:30,50:50at%)
6)
Nb/Zr alloy target (97:3,90:10wt%
7)
Si/Al alloy target (90:10,95:5,98:2,70:30,wt%)
8)
Zn/Al alloy
9)Pure
Cr target (99.95%,
99.995%)
10)Al/Cr alloy target
(70:30, 50:50at%)
11) Ni/Cu
alloy target (70:30,80:20,wt%)
12)Al/Nd alloy target (98:2wt%)
13)Mo/Nb
alloy target (90:10,wt%)
14)TiAlSi
alloy target (Ti/Al/Si=30/60/10, 33/67, 40/50/10 ,wt% and
at%)
15)CrAlSi
alloy target (Cr/Al/Si=30/60/10 ,wt% and
at%)and so on, and help set of target
material