Magnetron
sputtering metallizer is mainly used for decorative and
functional reaction films, which has the advantages of high
deposition rate and fast reaction speed, and completely overcomes
the phenomenon of cathode target surface poisoning and abnormal
glow discharge. Metallizing
single-layer films, multi-layer composite films, etc. on metal
and non-metal substrates. The updated
cathode sputtering target and power supply have been
configured. According to
customer product needs, multiple arc, planar target, cylindrical
target, twin target, ion source, etc. can be
selected. Note: Special configuration can be
provided according to customer process
requirements.
