详情
Titanium sputtering target
We supply metal and alloy sputtering target for PVD film coating
industry with kinds of materials which purity ranges from *9.9%
to *9.**9%
Available materials
(A-Z):
Aluminium
Chromium
Copper
Molybdenum
Nickel, Ni-Cr, Ni-V
Niobium, Nb-Zr
Silicon
Sliver / Gold
Tantalum, Ta-W
Titanium, Ti-Al, Ti-Cr, Ti-Ni,
Ti-Si, Ti-Zr
Tungsten, W-Re
Zirconium, Zr-Nb
Other materials and alloys upon
request
Surface:
Precisely machined / ground, shinny
bright surface
Roughness Ra 1.6, 0.8
Forms for sputtering
target:
Circular / planar / tubular
Custom-made form as per
drawing
Specification:
As per general industry standard or
customer’s specific demand
| 国家: |
China |
| 型号: |
TSNF-10
|
| 离岸价格: |
( Negotiable ) （面議）
获取最新报价
|
| 位置: |
China |
| 最小订单价格: |
- |
| 最小订单: |
1 Piece |
| 包装细节: |
Plywood case |
| 交货时间: |
- |
| 供应能力: |
100000 Kilogram per Month |
| 付款方式: |
PayPal, Money Gram, Western Union, L/C, T/T |
| 產品組 : |
Titanium sputtering target
|
