The Phantom III RIE is designed to supply research and failure analysis laboratories with state-of-the-art plasma etch capability using single wafers, dies or parts using fluorine and oxygen based chemistries. The system has a compact, modular design built on a space-saving platform.
国家: | USA |
型号: | - |
离岸价格: | 获取最新报价 |
位置: | - |
最小订单价格: | - |
最小订单: | - |
包装细节: | - |
交货时间: | - |
供应能力: | - |
付款方式: | Other |
產品組 : | - |