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Phantom III Reactive Ion Etch (RIE) System
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Phantom III Reactive Ion Etch (RIE) System

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1st 年

联系人 Addison

Clearwater, Florida

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The Phantom III RIE is designed to supply research and failure analysis laboratories with state-of-the-art plasma etch capability using single wafers, dies or parts using fluorine and oxygen based chemistries. The system has a compact, modular design built on a space-saving platform.

国家: USA
型号: -
离岸价格: 获取最新报价
位置: -
最小订单价格: -
最小订单: -
包装细节: -
交货时间: -
供应能力: -
付款方式: Other
產品組 : -
Phantom III Reactive Ion Etch (RIE) System

相关产品 Trion Technology

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