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New AccuThermo AW 610 for 2 to 6 inch wafer RTA RTP

New AccuThermo AW 610 for 2 to 6 inch wafer RTA RTP

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位置:

Santa Clara

最小订单价格:

-

最小订单:

1

包装细节:

-

交货时间:

-

供应能力:

30

付款方式:

-

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免费会员

联系人 Mr. Peter

220 Cochrane Circle, Morgan Hill, California

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详情

Allwin*1 is the exclusive licenced manufacture for AG Heatpulse **0. Allwin*1 is manufacturing the AccuThermo AW***0, AccuThermo AW **0, originally the AG Heatpulse ***** AccuThermo AW***0, AccuThermo AW **0 have innovative software and more advanced temperature control technologies. AccuThermo AW **0 is a desktop rapid thermal processor which uses high-intensity, visible radiation to heat single wafer for short periods at precisely controlled temperatures. These capabilities, combined with the heating chamber&#**9;s cold-wall design, superior heating uniformity advanced temperature control technology and AW **0 new software, provide significant advantages over conventional furnace processing and conventional RTP systems. Rapid thermal processing (or RTP) refers to a semiconductor manufacturing process which heats silicon wafers to high temperatures (up to ***0 C or greater) on a timescale of several seconds or less. The wafers must be brought down (temperature) slow enough however, so they do not break due to thermal ***** rapid heating rates are attained by high intensity lamps process. These processes are used for a wide variety of applications in semiconductor manufacturing including dopant activation, thermal oxidation, metal reflow and chemical vapor deposition. Rapid thermal anneal (RTA) is a process used in semiconductor device fabrication which consists of heating a single wafer at a time in order to affect its electrical properties. Unique heat treatments are designed for different effects. Wafers can be heated in order to activate dopants, change film-to-film or film-to-wafer substrate interfaces, densify deposited films, change states of grown films, repair damage from ion implantation, move dopants or drive dopants from one film into another or from a film into the wafer substrate. Rapid thermal anneals are performed by equipment that heats a single wafer at a time using lamp based heating that a wafer is brought near. Unlike furnace anneals they are short in duration, processing each wafer in several minutes. Rapid thermal anneal is a subset of processes called Rapid Thermal Process (RTP). AG Associates Heatpulse is one of the most famous RTP equipment manufacturers. Many Integrated Chip companies, R&D centers, Institutes all over the world have been using AG Heatpulse Systems. Allwin*1 Corp can provide the following refurbished RTP equipment AG Heatpulse **0 AG Heatpulse **0 AG Heatpulse **0 AG Heatpulse ***0 AG Heatpulse ***0 AG Heatpulse ***0S AG Heatpulse ***8

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Mr. Peter < Allwin21 Corp. >

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