Refurbished Gasonics AE 2001

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Manufacturer:Gasonics Refurbished by:Allwin*1 Corp Gasonics is a Registered Trademark of Novellus Corp.AE ***1 is a single wafer downstream isotropic etch system, designed to etch thin films such as poly silicon, silicon nitride and CVD oxides.Utilizing the proven Aura downstream microwave source and a dedicated reactor chamber, GaSonicsAE***1 offers high etch rates and no RF damage to the wafer. Featuring high reliability and flexibility in process parameter, GaSonics AE ***1 is the unparalleled tool of choice for multiple applications and high capital productivity. Gaonicsa AE***1 is an electro-mechanical production system used to etch materials such as nitride, oxide poly-silicon etc. from the surface of silicon or other substrate. Each wafer is processed individually by means a chemical reaction induced by a gas plasma. Allwin*1 Corp. can also provide advanced Equip Robot transfer wafer technology , AW Control Software and Superior Temperature Control Technology to upgrade the refurbished Gasonics AE ***1 which provides the following significant advantages. Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Etching is a critically important process module, and every wafer undergoes many etching steps before it is complete. If the etch is intended to make a cavity in a material, the depth of the cavity may be controlled approximately using the etching time and the known etch rate. More often, though, etching must entirely remove the top layer of a multilayer structure, without damaging the underlying or masking layers. The etching system&#**9;s ability to do this depends on the ratio of etch rates in the two materials (selectivity). Allwin*1 Corp can provide the following refurbished Etcher equipment. Refurbished Matrix**3 Refurbished Matrix**3 Refurbished Gasonics AE***1 Refurbished Gasonics PEP***0 Used Lam Rainbow ***0 Oxide Etch Used Lam ***8 for Plasma Etch