详情
The equipment integrated three technology of DC magnetron
sputtering, middle frequency sputtering and electric arc ion
evaporation, combining the linear ionize source and pulse bias
coating to thin the deposition particles. The various film
performance are improved, and be able to coat alloy film, compound
film, multilayer composite film on the surface of metal as well as
nonmetal. After years of dedicated R&D by our engineer, through
unique cathode electric arc ion and unbalanced magnetron systems,
we develop a package of PROPOWER series of computer automatic
control system. It makes the coating film adhesion density as well
as good complex consistency, and solve the problems of the
complexity of the manual operation, film color inconsistencies,
etc.
Characteristic: 1. The principle of magnetron
sputtering is based on the cathode glow discharge theory, expanding
the cathode surface magnetic field close to the surface of
workpiece, to increased the ionized rate of sputtering atoms. It
retains the delicate of the magnetron sputtering and increased the
glossiness.
***** performance of electric arc plasma evaporation source is
reliable, be able to work under the current *0A when optimize the
cathode and magnetic field structure coating, and the coating film
and substrate interface produce atomic diffusion, plus the feature
of the ion beam assisted deposition.
Applied industry: The equipment is widely used in IPG clocks,
IPS watches and clocks, guns IP, mobile phone shell, hardware,
sanitary ware, cutters, anti-friction tools, dies and mould, etc.
It can coat TiN, TiCN, CrN, TiALN, TiNbu, TiCrN, ZrN, and various
kinds of diamonds film (DLC).
