详情
1、Boride Ceramic Sputtering Targets: Cr2B, CrB, CrB2, Cr5B3,
FeB, HfB2 ,LaB6, Mo2B, Mo2B5 ,NbB, NbB2, TaB, TaB2, TiB2, W2B, WB,
VB, VB2, ZrB2
2、Carbide Ceramic Sputtering Targets :
B4C,Cr3C2,HfC,Mo2C,NbC,SiC,TaC, TiC, WC, W2C, VC, ZrC
3、Fluoride Ceramic Sputtering Targets : AlF3, BaF3, CdF2, CaF2,
CeF3, DyF3, ErF3, HfF4, KF, LaF3, PbF2, LiF, PrF3, MgF2, NdF3,
ReF3, SmF3, NaF, Cryolite, Na3AlF6 , SrF2, ThF4, YF3, YbF3
4、Nitrides Ceramic Sputtering Targets :AlN, BN,GaN, HfN, NbN,
Si3N4, TaN, TiN, VN, ZrN
5、Oxide Ceramic Sputtering targets: Al2O3, Sb2O3, ATO ,BaTiO3,
Bi2O3, CeO2, CuO, Cr2O3 ,Dy2O3 ,Er2O3, Eu2O3, Gd2O3, Ga2O3, GeO2,
HfO2, Ho2O3, In2O3, ITO, Fe2O3, Fe3O4, La2O3, PbTiO3, PbZrO3,
LiNbO3, Lu3Fe5O*2, Lu2O3, MgO, MoO3, Nd2O3, Pr6O*1, Pr(TiO2)2,
Pr2O3, Sm2O3, Sc2O3, SiO2, SiO, SrTiO3, SrZrO3, Ta2O5, Tb4O7, TeO2,
ThO2, Tm2O3, TiO2, TiO, Ti3O5, Ti2O3, SnO2, SnO, WO3, V2O5, YAG,
Y3Al5O*2, Yb2O3, Y2O3, ZnO, ZnO:Al, ZrO2(unstabilized),
ZrO*****5wt%CaO)
6、Selenides Ceramic Sputtering Targets: Bi2Se3, CdSe, In2Se3, PbSe,
MoSe2, NbSe2, TaSe2, WSe2, ZnSe
7、Silicides Ceramic Sputtering Targets: Cr3Si, CrSi2, CoSi2, HfSi2,
MoSi2, NbSi2, TaSi2, Ta5Si3, TiSi2, Ti5Si3, WSi2, V3Si, VSi2,
ZrSi2
8、Sulfides Ceramic Sputtering Targets: CuS, Sb2S3, As2S3, CdS, FeS,
PbS, MoS2, NbS1.*5, TaS2, WS2, ZnS
D、Other: AZO,Cr-SiO,CIGS,ITO,IGZO, GaAs, Ga-P, In-Sb, InAs, InP,
InSn, LSMO, Na3AlF6 ,YBCO, LCMO,YSZ
