离岸价格
获取最新报价( Negotiable )
|Minimum Order
位置:
China guangdong
最小订单价格:
-
最小订单:
1 Set
包装细节:
20 GP Container
交货时间:
50 days after payment
供应能力:
260 Set per Year
付款方式:
L/C, T/T
联系人 Ms. li
The 4th industry zone,Yanwu village,Dalingshan Town,Dongguan,Guangdong,China, Dongguan, Guangdong
Characteristic: 1. The principle of magnetron sputtering is based on the cathode glow discharge theory, expanding the cathode surface magnetic field close to the surface of workpiece, to increased the ionized rate of sputtering atoms. It retains the delicate of the magnetron sputtering and increased the glossiness.
2.The performance of electric arc plasma evaporation source is reliable, be able to work under the current *0A when optimize the cathode and magnetic field structure coating, and the coating film and substrate interface produce atomic diffusion, plus the feature of the ion beam assisted deposition.
