Equipment
overview:
Wafer drying machine has high cleanliness spin
rinsedry function. Mainly
used for silicon
wafer, reticle, solar
cells and other similar
materials washing drying. Structure:
Working cavity
structure, the
largest processing diameter**0mm. S
is a double cassette structure system
constitution:
The machine adopts double
station (or single) stack,product this type
structure, each station
can be run
independently without
mutual interference. Can
realize automatic process including rotary
flushing, drying, nitrogen resistivity monitoring, anti-static control, cavity drying, fault
display alarm, system cleaning.
The principle and characteristic
of structure Cleaning technology High power
brushless motor
drive Cleaning work Rotating nitrogen sealing technology Deionized
water control ESD control Earthquake, seismic isolation
technology Speed, counting control technology Brake control
technology System control
technology Processing software Particle
control performance Security and protection Door position monitoring and interlocking Production
technology
