Rotary Vane Pumps, Roots Pumping Systems, Central Vacuum Systems, Diffusion Pumps,Vacuum Valves,Cryo Vacuum, Vacuum Instruments

详情

Toshniwal is reckoned as a spearheading force in process control and instrumentation industry. We have more than 5 decades of experience in specialized area of process instrumentation, process vacuum and powder processing. Our team of engineers have successfully accomplished various projects, providing feasible solutions to meet the needs of global clients based on innovative analysis technologies, customized system engineering, sound knowledge of process applications and professional support.

We have been able to surge ahead in the competitive market with innovative engineering concepts and excellent customer support services as our forte. Our manufacturing unit is spread over Analytical, Process Control, Electronics and Laboratory Product domains, through successful international collaborations.

Fueled by technology, we are uniquely positioned to help organizations to accomplish their goals faster, smarter and in a cost-effective manner.

Toshniwal quality begins with solid, robust product designs resulting in products that lead the industry in reliability. Backed by an integrated Total quality management system, our products are guaranteed to provide long, trouble-free life for your application.

We offer unique and innovative vacuum solutions for semiconductor production, Chemical & Pharma research, and other industrial applications. Toshniwal incorporates engineering, design and manufacturing concepts to bring you solutions aimed not just at vacuum performance, but at today's equally important issues of productivity, efficiency and cost of ownership. As such, all Toshniwal vacuum solutions are designed with the following criteria in mind.

• Highest performance for the price... value
• Robust and reliable
• Easy to repair... even in the field
• Economical to operate

• Your processes have become sensitive to potential contamination from the pumps and leak detectors you use.... Toshniwal developed a variety of models that operate without contaminating manufacturing substances.
• Your processes are more sensitive to small leaks... we have very high-sensitivity leak detectors that operate with the ease, speed.
• Your processes involve the use of chemical substrates that damage conventional pumps, causing downtime and productivity losses... we have developed pumps that withstand the effects of these materials and operate reliably for extended periods.