Made in U.S.A.:Dominant manufacturer of RTP systems
详情
The AccuThermo AW**0
was derived from the AG Associates **0 production-proven
design. Allwin*1 Corp. is the exclusive
manufacturer of the AG Associates Heatpulse **0 desktop
atmospheric RTP (Rapid Thermal Processing) system. The
system uses high intensity visible radiation to heat single wafer
for short process periods of time at precisely controlled
temperatures. The process periods are typically 1‑**0 seconds in
duration, although periods of up to ***9 seconds can be selected.
These capabilities, combined with the heating chamber's cold-wall
design and superior heating uniformity, provide significant advantages
over conventional furnace processing. AccuThermo AW **0
Applications:
*5 years
production-proven Real RTP/RTA/RTO/RTNsystem.
Scattered IR
light by special gold plated Al chamber surface.
Allwin*1 advanced
Software package with real time control technologies and many
useful functions.
Consistent wafer-to-wafer
process cycle repeatability.
Top and bottom
High-intensity visible radiation Tungsten halogen lamp
heating for fast heating rates with good repeatability
performance and long lamp lifetime.
Cooling N2 (Or
CDA) flows around the lamps and quartz isolation tube for
fast cooling rates
Elimination of
external contamination by Isolated
Quartz Tube
Up to six gas
lines with MFCs and shut-off valves
Energy
efficient.
Made in U.S.A.
Small footprint
AccuThermo AW **0 Software Key
Features:
Integrated process control
system
Real time graphics
display
Real time process data
acquisition, display, and analysis
Programmed comprehensive
calibration and diagnostic functions
Closed-loop temperature control
with temperature sensing.
Precise time-temperature
profiles tailored to suit specific process
requirements.
Faster, easier Programmable
comprehensive calibration of all subsystems, leading to
enhanced process results.
A recipe editor to create and
edit recipes to fully automate the processing of wafers inside
the AccuThermo RTP
Validation of the recipe so
improper control sequences will be revealed.
Storage of multiple recipes,
process data and calibration files so that process and
calibration results can be maintained and compared over
time.
Passwords provide security for
the system, recipe editing, diagnostics, calibration and setup
functions.
Simple and easy to use menu
screen which allow a process cycle to be easily defined and
executed.
Troubleshooting
feature which allows
engineers and service personnel to activate individual
subassemblies and functions. More I/O, AD/DA
exposure.
Use PowerSum technology to
detect the process and increase Yield.
Watchdog function: If this
board looses communication with the control software, it will
shut down all processes and halt the system until communication
is restored.
Recommended ramp
up rate: Programmable, *0°C to **0°C per second.
Maximum Rate: **0°C (NOT RECOMMENDED)
Recommended
steady state duration: ****0 seconds per step.
Ramp down
rate: Non-programmable, *0°C to **0°C per
second.
Recommended
steady state temperature range: **0°C - ***0°C. Maximum
***0°C (NOT RECOMMENDED)
ERP Pyrometer
*******0°C with ±1°C accuracy when calibrated against an
instrumented thermocouple wafer.
Thermocouple
******0°C with ±0.5°C accuracy & rapid response.
Temperature
repeatability: ±0.5°C or better at ***0°C
wafer-to-wafer. (Repetition specifications are based on
a ***-wafer set.)
Temperature
uniformity: ±5°C across a 6" (**0 mm) wafer at ***0°C.
(This is a one sigma deviation **0 angstrom oxide.) For
a titanium silicide process, no more than 4% increase in
non-uniformity during the first anneal at **0°C to
**0°C.
Process/Purge gas
s: Any inert and/or non-toxic gas regulated to *0 PSIG
and pre-filtered to 1 micron. Typically, N2, O2, Ar, He,
forming gas, NH3, N2O2 are used.
. AccuThermo AW **0
Configuration:
AccuThermo AW **0
Main Frame with wires.
Power Type: Three
Phase, worldwide power (*0/*0 Hz)
CE Mark if
Necessary
Pentium® class
computer with a **-inch LCD monitor and Allwin*1 Corp
proprietary software package.
Mouse and
standard keyboard.
Aluminum oven
chamber with water cooling passages and gold plating
plates.
Door plate with
one TC connection port.
Isolated Quartz
Tube W/O Pyrometer window or with Pyrometer Window.
Oven control
board and one main control board.
Bottom and top
heating with *1 (1.2KW ea) Radiation heating lamp module with
4 bank zones (Top Front&Rear, Bottom
Front&Rear).
Quartz Tray for 4
to 6 inch round wafer or customized.
Gas line with Gas
MFC without shut-off valve.
T-Shape Quartz
with qualified K-Type TC and one set holder for ******0°C
temperature measurement.
Package of 5
pieces of thermocouple wires as spare TC
USB with original
Software backup.
AccuThermo AW **0
Options:
Multiple Process Gases (Up to
6) and MFCs with Extended Gas Box and Gas Control
Board
Carrier or Susceptor for
small sample, transparent substrate and substrate with metal
thin film on top.
Patented ERP
Pyrometer (*******0°C) as non-contact high temperature
sensor.
Chiller for ERP
Pyrometer
*-inch, *-inch,
*-inch TC Wafer, Single Point for Pyrometer
calibration
Omega Meter for
Pyrometer and Thermocouple calibration
Shutt-off valve for Quartz
Tube & Lamps cooling control
