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pecvd system for graphene production
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pecvd system for graphene production

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联系人 elaine

Hefei, Anhui

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Plasma enhanced rotational PECVD system,
BTF****0C-R-PECVD
 
Product description
The whole experimental cavity is in the glow generation region, uniform equivalent glow, this technology is a good solution to the traditional plasma work instability, In this way, the range and intensity of ionization is **0 times of that of the traditional PECVD, to the uneven accumulation of materials .
Use a quartz tube of a special shape (thin middle between two ends) as a reaction chamber for chemical vapor deposition.The furnace tube can rotate **0 degrees, Quartz stopper on the inner wall of the tube can help stir-fry the powder material and sintered more evenly, and the furnace body can be tilted to the left and right at a large angle, which is convenient to feed in and out, and the inclined angle is adjustable from 0 to  *5 degree.
Widely used in the preparation of graphene at low temperature and the carbon coating experiment of powder material.
Main parameter

Furnace  
Max. Tem ***0°C
 
Heating zone length **0mm
Constant zone length **0mm
Tem. control PID automatic control with *0 steps programmableOperation interface is 7 "industrial control computer  
Tube Size Φ*0***0+Φ**0***0+Φ*0***0mm
Furnace body inclination angle  0~*5°(adjustable
Furnace tube rotation rate 3~*3r/min
PE source  
Signal frequency *3.*6 MHz±0.**5%
Power output range ****0W
Max. reflection power **0W
RF output interface *0 Ω, N-type, female
Power stability 5W
Gas supply system High precision mass FlowmeterRange optional
Accuracy ±1.5%
Response accuracy ±0.2%
Response time Gas characteristics14sec
Electrical characteristics *0sec
 
Working pressure difference range 0.10.5MPa
Max. pressure 3MPa
Connection Φ6mmDouble clasp stainless steel joint
Vacuum unit KF*5 series bellows and manual stopper valves
Vacuum degree ***1 pa
The value can be displayed intuitively by the digital display vacuum tester
 

国家: China
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