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pecvd system for graphene production

China

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详情

Plasma enhanced rotational PECVD system,
BTF-1200C-R-PECVD
 
Product description
The whole experimental cavity is in the glow generation region, uniform equivalent glow, this technology is a good solution to the traditional plasma work instability, In this way, the range and intensity of ionization is 100 times of that of the traditional PECVD, to the uneven accumulation of materials .
Use a quartz tube of a special shape (thin middle between two ends) as a reaction chamber for chemical vapor deposition.The furnace tube can rotate 360 degrees, Quartz stopper on the inner wall of the tube can help stir-fry the powder material and sintered more evenly, and the furnace body can be tilted to the left and right at a large angle, which is convenient to feed in and out, and the inclined angle is adjustable from 0 to  35 degree.
Widely used in the preparation of graphene at low temperature and the carbon coating experiment of powder material.
Main parameter
Furnace  
Max. Tem 1200°C
 
Heating zone length 440mm
Constant zone length 200mm
Tem. control PID automatic control with 30 steps programmableOperation interface is 7 "industrial control computer  
Tube Size Φ60*420+Φ100*360+Φ60*420mm
Furnace body inclination angle  0~35°(adjustable
Furnace tube rotation rate 3~13r/min
PE source  
Signal frequency 13.56 MHz±0.005%
Power output range 0-500W
Max. reflection power 100W
RF output interface 50 Ω, N-type, female
Power stability 5W
Gas supply system High precision mass FlowmeterRange optional
Accuracy ±1.5%
Response accuracy ±0.2%
Response time Gas characteristics14sec
Electrical characteristics 10sec
 
Working pressure difference range 0.10.5MPa
Max. pressure 3MPa
Connection Φ6mmDouble clasp stainless steel joint
Vacuum unit KF25 series bellows and manual stopper valves
Vacuum degree 10-1 pa
The value can be displayed intuitively by the digital display vacuum tester
 

联系我们

联系人: elaine

公司名称:Anhui BEQ Equipment Technology CoLtd

办公地址:Hefei, Anhui, China,

电话号码:

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